ERC ion source

Time：2022/6/29 18:52:51　Hits:677

ECR ion source has been used more and more in recent years because of its high ion beam current and long life. Because of its excellent performance, ECR ion source has been widely used in vacuum coating, semiconductor etching, ion beam processing, accelerator and other fields. The picture shows our self-designed ECR ion source, which can generate proton beams with beam intensity up to 100 mA when the extraction voltage is 40kV.
The company can provide overall design and customization services for various types of ECR ion source systems according to customer needs.
ECR ion source parameter index:
Ion beam current size: 1mA-100mA;
It can be used in accelerator, semiconductor etching, ion beam processing and other fields.