RF ion source

Time：2022/6/29 18:52:41　Hits:1068

RF ion source is used to generate ion beam. Due to relatively mature technology and relatively low price, it has been widely used in vacuum coating, semiconductor etching, ion beam processing and other fields. The picture shows an independently designed radio frequency ion source, which can generate 5 mA proton beams or other ion beams in the form of gas.
The company can provide overall design and customization services for various types of RF ion source systems according to customer needs.
RF ion source parameter index:
Ion beam current size: 1mA-100mA;
It can be used in accelerator, semiconductor etching, ion beam processing and other fields.